Ge microdisk with lithographically-tunable strain using CMOS-compatible process
نویسندگان
چکیده
منابع مشابه
Ge microdisk with lithographically-tunable strain using CMOS-compatible process.
We present germanium microdisk optical resonators under a large biaxial tensile strain using a CMOS-compatible fabrication process. Biaxial tensile strain of ~0.7% is achieved by means of a stress concentration technique that allows the strain level to be customized by carefully selecting certain lithographic dimensions. The partial strain relaxation at the edges of a patterned germanium microd...
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We propose and investigate in detail a novel tunable, compact, room temperature terahertz (THz) emitter using individual microdisk resonators for both optical and THz waves with the capability of radiating THz field in 0.5–10 THz range with tuning frequency resolution of 0.05 THz. Enhanced THz generation is achieved by employing a nonlinear optical disk resonator with a high value of second-ord...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2015
ISSN: 1094-4087
DOI: 10.1364/oe.23.033249